Sample
Name
H2O crystalline ice - deposition 143K - film 7.85µm
Database
Experimentalists
Date
1991-07-01
Physical characteristics
Thickness
7.85 $\pm$ 0.08 ${\mu}m$
Diameter
20000.0 ${\mu}m$
Volume
2400.0 $micron^3$
Surface roughness
very low
Substrate material
Polyethylene High Density window
Substrate comments
disk diameter 25mm, thickness 2mm
Comments
Thin film - 3rd deposition at 143K, and then cooled (80K) and heated during spectra recording (from 80K to 160K)
Temperature
100.0 $\pm$ 0.5 $K$
Time at T
10.0 $min$
Temperature max
143.0 $\pm$ 0.5 $K$
Time at Tmax
10.0 $min$
Type
vacuum
Fluid pressure
1.0e-12 $\pm$ 1.0e-12 $bar$
Comments
residual UHV vacuum gases
Publications
Number
1
Layers
Title
Formation of solid crystalline ice phase

Precursors

Matters

Produced sample

Sample
H2O crystalline ice - deposition 143K - film 7.85µm (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation 1991-07-01 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas; most air but only part of CO2 is removed]
#2 before layer formation 1991-07-01 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase]
#3 during layer formation 1991-07-01 layer formation room T H2O gas deposited at low flux at 143K under vacuum from gas to solid crystalline ice phase]