Formamide (HCONH2) amorphous deposited at 10K | MIA | SSHADE

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Sample

Name: Formamide (HCONH2) amorphous deposited at 10K

Owner of sample

Database

MIA

Experimentalists

Patrice Theulé

Origin of sample

Date: 2004-11-04

Physical characteristics

Thickness: 28.0 $\pm$ 20.0 $nm$
Substrate material: gold plated copper surface

Sample environment: Temperature

Temperature: 10.0 $\pm$ 0.2 $K$
Temperature max: 12.0 $K$

Sample environment: Fluid

Type: vacuum
Fluid pressure: 1.0e-08 $hPa$

Documentation and publication

Publications

Raunier, 2004, Astron. Astrophys., 416, 165 - 169

Layers in sample

Number

1

Layers

Layer #1 , 28.0 $nm$

Sample processings

Title

vapor deposition

Produced sample

Sample

Formamide (HCONH2) amorphous deposited at 10K (this sample)

Processing steps

Step	Chronology	Date	Type	Process	Changes
#1	before layer formation		thermal	evaporation of formamide
#2	before layer formation		layer formation	freezing of gas-phase formamide