Sample
Name
SiS, amorphous
Date
1995-01-01
Thickness
0.2
Diameter
8.0
Comments
The sample surface has the cylindrical shape of the silica tube (inner radius 4 mm) in which it was solidified.
Temperature
300.0 5.0
Temperature max
300.0
Type
ambient air
Fluid temperature
300.0
Fluid pressure
1000.0
Title
Preparation of the SiS sample

Produced sample

Sample
SiS, amorphous (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation 1996-01-01 mixing Mixing and homogenization of 0.6 g sulfur and 0.2628 g silicon and subsequent sealing of the mixture in a quartz tube with 8 mm inner diameter (under vacuum)
#2 before layer formation 1996-01-01 thermal Gradually heating to 1373 K and holding the temperature constant for 60 hours for melting the mixture
#3 during layer formation 1996-01-01 thermal Quenching of the melt by dropping the hot tube directly from furnace into water transparent SiS glass was formed at the wall in the center of the tube
#4 after layer formation 1996-01-01 mechanical Mounting of the glassy sample under argon atmosphere on a special sample holder for infrared reflection measurements at curved surfaces (4 mm radius of curvature)