Layer
Name
thin film
Type of layer
compact
Thickness
84.0  $\pm$ 0.1  $nm$
Texture
compact fine grained
Type of porosity
without pores
Porosity
0.0e+00 $\pm$ 0.05
Density
0.93 $\pm$ 0.02 $g.cm^{-3}$
Formation mode
single gas deposition
Temperature
150.0  $\pm$ 1.0  $K$
Rate
23s
Fluid pressure
2.0e-10  $mbar$
Comments
thin film deposited under vacuum from flow of H2O gas (150K) with one deposition tube at 90° incidence
Number
1
Arrangement
single material
Materials
  Name Arrangement Mass (g) Mass fraction Abundance comments
H2O crystalline - phase Ih and/or Ic 1.0