Sample
Name
H2S amorphous
Date
1992-09-16
Diameter
20000.0 ${\mu}m$
Surface roughness
very low
Substrate material
CsI
Substrate comments
disk diameter 25mm, thickness 2mm
Temperature
56.0 $\pm$ 0.5 $K$
Temperature max
56.0 $\pm$ 0.5 $K$
Type
vacuum
Fluids
Fluid pressure
1.0e-08 $mbar$
Title
Deposition of H2S to amorphous solid phase

Precursors

Matters

Produced sample

Sample
H2S amorphous (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 during layer formation 1996-01-01 layer formation room T gas deposited at 56K under vacuum from H2S gas to amorphous solid phase