Sample
Name
thin film H2O amorphous Ia ice
Date
1991-05-28
Diameter
20000.0 ${\mu}m$
Surface roughness
very low
Substrate material
PE-HD
Substrate comments
disk diameter 25mm, thickness 2mm
Comments
sample deposited at 33.2K and then subjected to heating/cooling cycles during spectrum recording (warming to 100K, cooling to 33.5K, and heating up to crystallization
Temperature
87.5 $\pm$ 2.5 $K$
Time at T
12.0 $min$
Temperature max
87.5 $\pm$ 2.5 $K$
Time at Tmax
12.0 $min$
Comments
spectrum recorded between 85.0K and 90.1K during a heating ramp
Type
vacuum
Fluid pressure
1e-12 $\pm$ 1e-12 $bar$
Comments
residual UHV vacuum gases
Title
condensation of amoprhous H2O ice

Precursors

Matters

Produced sample

Sample
thin film H2O amorphous Ia ice (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation 1995-11-12 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas
#2 before layer formation 1995-11-12 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase
#3 during layer formation 1995-11-12 layer formation low flux of room temperature H2O gas deposited at 33.2K under vacuum from gas phase to solid amorphous Ia ice phase