Sample
Name
H2O crystalline ice - deposition 145K
Database
Experimentalists
Date
1995-11-12
Physical characteristics
Thickness
0.74 $\pm$ 0.02 ${\mu}m$
Diameter
20000.0 ${\mu}m$
Volume
230.0 $micron^3$
Surface roughness
very low
Substrate material
CsI
Substrate comments
disk diameter 25mm, thickness 2mm
Comments
Thin film - 3rd deposition at 145K, and then cooled during spectra recording (from 145K to 17K)
Temperature
60.0 $\pm$ 0.1 $K$
Time at T
10.0 $min$
Temperature max
145.0 $\pm$ 0.1 $K$
Time at Tmax
12.0 $min$
Type
vacuum
Fluid pressure
1.0e-12 $\pm$ 1.0e-12 $bar$
Comments
residual UHV vacuum gases
Publications
Number
1
Layers
Title
Formation of solid crystalline ice phase

Precursors

Matters

Produced sample

Sample
H2O crystalline ice - deposition 145K (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation 1995-11-12 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas;most air but only part of CO2 is removed]
#2 before layer formation 1995-11-12 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase]
#3 during layer formation 1995-11-12 layer formation room T H2O gas deposited at low flux at 145K under vacuum from gas to solid crystalline ice phase]