Layer
- Name
- Tholins Film for X-ray irradiation LATMOS 95%N2:5%CH4
- Type of layer
- compact
- Thickness
- 1139.0 ± 42.0 nm
- Texture
- compact
- Type of porosity
- without pores
- Comments
- Homogeneous organic thin film.
- Formation mode
- manual deposition
- Temperature
- 308.0 ± 15.0 K
- Pressure
- 0.0009 ± 2e-05 None
- Rate
- 0.12 nm.s-1
- Comments
- Formed using the PAMPRE experiment