Sample
Name
SiC, amorphous
Date
1998-01-01
Thickness
65.0 nm
Substrate material
silicon
Temperature
300.0 ± 5.0 K
Temperature max
1123.0 K
Type
ambient air
Fluid temperature
300.0 K
Fluid pressure
1000.0 mbar
Number
1
Layers
Title
Production of amorphous SiC

Produced sample

Sample
SiC, amorphous (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation thermal Conversion of the polymer dimethylpolysilane (-Si(CH3)2)n to polycarbosilane (PCS) (-CH2-SiHCH3-CH2-Si(CH3)2)n
#2 during layer formation thermal Heating a sheet of polycarbosilane on Si substrate to 1123 K and hold for one hour. a thin film of SiC for IR transmission measurements was produced
Comments
To avoid the oxidation of polycarbosilane to silicon oxide all preparational steps were applied in a glove box and the heating procedure was performed under dried argon atmosphere.