O2:O3 ice mixture deposited at 10K | ACID | SSHADE

Processing math: 100%

Sample

Name: O2:O3 ice mixture deposited at 10K

Owner of sample

Database

ACID

Experimentalists

Origin of sample

Date: 2014-01-01
Previous sample: O2 ice deposited at 10K
Parent sample: O2 ice deposited at 10K

Physical characteristics

Substrate material: LiF
Substrate comments: 2mm thick

Sample environment: Temperature

Temperature: 10.0 $\pm$ 1.0 $K$

Sample environment: Fluid

Type: vacuum
Fluid pressure: 1.0e-08 $mbar$

Sample environment: Irradiation

Source: synchrotron radiation
Chronology: before spectrum
Irradiation time: 10800.0 $s$

Particle

Family: photons
Type: VUV photons
Energy: 10.0 $eV.particle^{-1}$

Documentation and publication

Publications

Sivaraman et al., 2014, Chem. Phys. Lett., 603, 33 - 36

Layers in sample

Number

1

Layers

O2:O3 ice mixture deposited at 10K