- Name
- thin film H2O ice (initially amorphous and partially cristalized through heating from 50 K to 160 K)
- Database
- Experimentalists
- Date
- 2024-04-08
- Thickness
- 129.0 $\pm$ 0.2 $nm$
- Diameter
- 13000000.0 $nm$
- Substrate material
- ZnSe
- Substrate comments
- disk diameter 13 mm, thickness 2 mm
- Comments
- prepared with the IGLIAS setup - sample deposited at 50 K and then progressively heated up to 160 K. Spectra recorded every additional 10K
- Temperature
- 50.0 $\pm$ 1.0 $K$
- Time at T
- 30.0 $\pm$ 5.0 $min$
- Temperature max
- 50.0 $K$
- Type
- vacuum
- Fluid pressure
- 2.0e-07 $\pm$ 1.0e-08 $mbar$
- Number
- 1
- Layers
-
- thin film , 129.0 $nm$
- Title
- condensation of amorphous H2O ice
- Matters
- Sample
- thin film H2O ice (initially amorphous and partially cristalized through heating from 50 K to 160 K) (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 before layer formation 2024-04-08 fluid physical three freeze-thaw cycles with liquid nitrogen to purify the water #2 before layer formation 2024-04-08 fluid physical sublimation of solid H2O at a few tens of °C under vacuum from solid to gas phase #3 during layer formation 2024-04-08 layer formation flux of H2O gas was deposited at 50 K under vacuum from gas to solid amorphous ice phase