Sample
Name
thin film of amorphous H2O obtained after irradiation
Date
2024-10-10
Thickness
144.0 $\pm$ 0.2 $nm$
Diameter
13000000.0 $nm$
Substrate material
ZnSe
Substrate comments
disk diameter 13 mm, thickness 2 mm
Comments
prepared with the IGLIAS setup - sample deposited at 150 K and then cooled to the desired irradiation temperature (110K) and then irradiated during spectrum recording
Temperature
90.0 $\pm$ 1.0 $K$
Time at T
30.0 $\pm$ 5.0 $min$
Temperature max
90.0 $\pm$ 1.0 $K$
Type
vacuum
Fluid pressure
2.0e-07 $\pm$ 1.0e-08 $mbar$
Number
1
Layers
Title
irradiation leading to amorphization

Precursors

Samples

Produced sample

Sample
thin film of amorphous H2O obtained after irradiation (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 on parent sample 2024-10-10 irradiation ions irradiation