- Database
- Experimentalists
- Date
- 2024-10-08
- Thickness
- 115.0 ± 0.2 nm
- Diameter
- 13000000.0 nm
- Substrate material
- ZnSe
- Substrate comments
- disk diameter 13 mm, thickness 2 mm
- Comments
- prepared with the IGLIAS setup - sample deposited at 150 K and then cooled to the desired irradiation temperature (110K) and then irradiated during spectrum recording
- Temperature
- 120.0 ± 1.0 K
- Time at T
- 30.0 ± 5.0 min
- Temperature max
- 120.0 ± 1.0 K
- Type
- vacuum
- Fluid pressure
- 2.0e-07 ± 1.0e-08 mbar
- Number
- 1
- Layers
-
- thin film , 115.0 nm
- Title
- condensation of crystalline H2O ice (Ih or Ic)
- Matters
- Sample
- thin film H2O crystalline ice (Ic or Ih) (this sample)
- Processing steps
-
Step Chronology Date Type Process Changes #1 before layer formation 2024-08-10 fluid physical three freeze-thaw cycles with liquid nitrogen to purify the water #2 before layer formation 2024-08-10 fluid physical sublimation of solid H2O at a few tens of °C under vacuum from solid to gas phase #3 during layer formation 2024-08-10 layer formation flux of H2O gas was deposited at 150 K under vacuum from gas to solid crystalline ice phase (Ih or Ic)