Layer
- Name
- HC3N crystalline - dep 100K
- Type of layer
- compact
- Texture
- compact poor grained
- Porosity
- 0.0e+00 0.05
- Comments
- 2 thickness used: ?? and ?? µm
- Formation mode
- single gas deposition
- Temperature
- 100.0 0.5
- Comments
- Thin film deposited under vacuum from slow molecular flow of HC3N gas with a single deposition tube