- Database
- Experimentalists
- Date
- 1995-04-25
- Parent sample
- CH4 crystalline II - film 0.545µm
- Thickness
- 0.775 $\pm$ 0.015 ${\mu}m$
- Diameter
- 20000.0 ${\mu}m$
- Volume
- 240000000.0 $micron^3$
- Surface roughness
- very low
- Substrate material
- CsI
- Substrate comments
- window 2mm thick
- Comments
- Thin film - 3rd deposition
- Temperature
- 15.0 $\pm$ 0.5 $K$
- Temperature max
- 15.0 $\pm$ 0.5 $K$
- Type
- vacuum
- Publications
- Number
- 1
- Layers
-
- CH4 crystalline II - film 0.775µm , 0.775 ${\mu}m$