Sample
Name
H2O amorphous ice - deposition 15K
Date
1995-11-12
Diameter
20000.0 ${\mu}m$
Surface roughness
very low
Substrate material
CsI
Substrate comments
disk diameter 25mm, thickness 2mm
Comments
Thin film - deposition at 15K
Temperature
15.0 $\pm$ 1.0 $K$
Time at T
10.0 $min$
Temperature max
15.0 $\pm$ 1.0 $K$
Time at Tmax
12.0 $min$
Type
vacuum
Fluid pressure
1.0e-12 $\pm$ 1.0e-12 $bar$
Comments
residual UHV vacuum gases
Title
condensation of amorphous H2O ice

Precursors

Matters

Produced sample

Sample
H2O amorphous ice - deposition 15K (this sample)
Processing steps
Step Chronology Date Type Process Changes
#1 before layer formation 1995-11-12 fluid physical several freeze-thawn cycles of liquid H2O under dynamic primary vacuum (pumping) removing of air and some CO2 gas
#2 before layer formation 1995-11-12 fluid physical evaporation at ~20°C of liquid H2O from liquid to gas phase
#3 during layer formation 1995-11-12 layer formation room T H2O gas deposited at low flux at 15K under vacuum from gas phase to solid amorphous ice phase